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RF injection probes

Injection of high-frequency currents and voltages into IC pin (IEC EN 62132-4)

Up to now the RF of a certain power was coupled into the pins of an IC to characterize its disturbance immunity. The IC's malfunction then indicated any internal interference. This measuring method has now been refined thanks to the new probes in the 500 series of the IC test system:

The RF disturbance from the power amplifier flows through the connected probe to the pin under examination. An RF current and voltage measurement is carried out in the probe tip at the same time.

The parameters recorded allow more precise conclusions to be drawn with regard to an IC's EMC:

Functional faults that occur at large current values have magnetic causes; capacitive coupling will be the cause at large voltage values. The reactive currents measured with the new measuring procedures are not detected by a common power measurement. Thus, detailed physical findings remained in the dark. IC development benefits from this new measuring method of RF injection.



Probes 500

Probe 502

Technical data

RF injection probes:

Probe 501

Probe 502

Probe 503

Ammeter:

200 kHz - 3 GHz

200 kHz - 3 GHz

200 kHz - 1.5 GHz

Max. current:

1 A

1 A

1 A

Voltmeter:

16 kHz - 3 GHz

16 kHz - 3 GHz

16 kHz - 3 GHz

Max. voltage:

40 Veff

1 Veff

50 Veff

Transfer factor:

- 40 dB

0 dB

- 40 dB

 

Coupling capacitance:

3 µF oder 6.8 nF*

3 µF oder 6.8 nF*

3 µF oder 6.8 nF*

Max. power transmission:

30 W

30 W

30 W

Auxiliary power:

12 V

12 V

12 V



* Ck order by choice or external limit


Equivalent circuit (DPI - Norm Ck = 6.8 nF)
Transfer factor Ammeter-P503 from 200 kHz to 2 MHz