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P500 probes for RF injection based on IEC EN 62132-4

P500 - Measurement place for RF injection (DPI-method)

Injection of high-frequency currents and voltages into IC pin

Up to now the RF of a certain power was coupled into the pins of an IC to characterize its disturbance immunity. The IC's malfunction then indicated any internal interference.

 

The RF disturbance from the power amplifier flows through the connected probe to the pin under examination. An RF current and voltage measurement is carried out in the probe tip at the same time. The parameters recorded allow more precise conclusions to be drawn with regard to an IC's EMC.

Functional faults that occur at large current values have magnetic causes; capacitive coupling will be the cause at large voltage values. The reactive currents measured with the new measuring procedures are not detected by a common power measurement. Thus, detailed physical findings remained in the dark. IC development benefits from this new measuring method of RF injection.


Technical data

RF injection probes:

Probe 501

Probe 502

Probe 503

Ammeter:

2 MHz - 3 GHz

2 MHz - 3 GHz

200 kHz - 1.5 GHz

Max. current:

1 A

1 A

1 A

Voltmeter:

16 kHz - 3 GHz

16 kHz - 3 GHz

16 kHz - 3 GHz

Max. voltage:

50 Veff

1 Veff

50 Veff

Transfer factor:

- 40 dB

0 dB

- 40 dB

 

Coupling capacitance:

3 µF oder 6.8 nF*

3 µF oder 6.8 nF*

3 µF oder 6.8 nF*

Max. power transmission:

30 W

30 W

30 W

Auxiliary power:

12 V

12 V

12 V



* Ck order by choice or external limit


Equivalent circuit (DPI - Norm Ck = 6.8 nF)
Transfer factor Ammeter-P503 from 200 kHz to 2 MHz